• Product Overview
  • Product features

ICP-7762 Inductively Coupled Plasma Optical Emission Spectrometer

The ICP-7762 utilizes vertical torch dual-view technology. The vertical torch prevents high-salt deposition, thereby extending the service life of the torch. Axial viewing provides low detection limits and high sensitivity, while radial viewing avoids matrix interference. Simultaneous viewing balances both axial and radial observations, offering relatively high sensitivity while partially mitigating matrix effects.


  • Wavelength Range: 165 ~ 800 nm

  • Simultaneous Acquisition: Achieves simultaneous data collection for all elements in the sample across the full spectrum.

  • Qualitative Analysis: Capable of performing qualitative analysis on unknown samples without the need to prepare standard solutions or establish methods.

  • Observation Method: Vertical torch dual-view technology.

  • Purge Gas System: The CCD and the optical chamber are purged independently. The CCD features an automatic purge function that adjusts the gas flow dynamically based on humidity levels, which not only improves the purge speed but also conserves gas. Additionally, the independent purge system allows for the exclusive use of nitrogen as the purge gas to reduce operating costs.


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  • Wavelength Range: 165 ~ 800 nm

  • Simultaneous Acquisition: Achieves simultaneous data collection for all elements in the sample across the full spectrum.

  • Qualitative Analysis: Capable of performing qualitative analysis on unknown samples without the need to prepare standard solutions or establish methods.

  • Observation Method: Vertical torch dual-view technology.

  • Purge Gas System: The CCD and the optical chamber are purged independently. The CCD features an automatic purge function that adjusts the gas flow dynamically based on humidity levels, which not only improves the purge speed but also conserves gas. Additionally, the independent purge system allows for the exclusive use of nitrogen as the purge gas to reduce operating costs.


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